Akira Nakano

This inventor holds 32 USPTO granted patents, primarily in Plasma Processing Technology. Top assignees: Alps Electric Co., Ltd., Frontec Incorporated, Seiko Epson Corporation. Active years: 1983-2009.

USPTO Granted Patents = 32

% Patents Active = 81.3

Average Co-Inventor Count = 2.5

ph-index = 11

Forward Citations = 529(Granted Patents)

Location History:

Meguro-ku, Tokyo-to, JP (1983 - 1990)
Furukawa, JP (1996 - 2001)
Miyagi-ken, JP (1999 - 2009)

Company Filing History:

19 out of 4,048

Alps Electric Co., Ltd.

Seiko Epson Corporation

patents

4. 11 out of 834,453

Other

patents

where one patent can have more than one assignee

Years Active: 1983-2009

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Areas of Expertise:

Plasma Processing Apparatus

Liquid-Crystal Display

Flexible Printed Circuit Board

Electro-Optical Device

Performance Evaluation

Impedance Measurement Tool

Plasma Treatment Equipment

Sputtering Method

Matching Circuit

High Frequency Power Supply

Electrostatic Charge Removal

Thin-Film Transistor

32 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7521739 - Illuminating device and method of fabricating the same (2009-04-21),

2. 7301517 - Liquid-crystal display apparatus capable of reducing line crawling (2007-11-27),

3. 7242087 - Flexible printed circuit board (2007-07-10),

4. 7225754 - Plasma processing apparatus including a plurality of plasma processing units having reduced variation (2007-06-05),

5. 7120556 - Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level (2006-10-10),

6. 7095178 - Plasma processing apparatus, method for operating the same, designing system of matching circuit, and plasma processing method (2006-08-22),

7. 6954033 - Plasma processing apparatus (2005-10-11),

8. 6899787 - Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system (2005-05-31),

9. 6871111 - Performance evaluation method for plasma processing apparatus (2005-03-22),

10. 6795796 - Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level (2004-09-21),

11. 6792889 - Plasma processing apparatus and method capable of performing uniform plasma treatment by control of excitation power (2004-09-21),

12. 6750614 - Plasma processing apparatus capable of performing uniform plasma treatment by preventing drift in plasma discharge current (2004-06-15),

13. 6714833 - Performance evaluation method for plasma processing apparatus (2004-03-30),

14. 6701202 - Performance evaluation method for plasma processing apparatus (2004-03-02),

15. 6587174 - Active matrix type liquid crystal display (2003-07-01),

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