The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Sep. 04, 2003
Akira Nakano, Miyagi-ken, JP;
Tadahiro Ohmi, Sendai-shi, Miyagi-ken, JP;
Akira Nakano, Miyagi-ken, JP;
Tadahiro Ohmi, Sendai-shi, Miyagi-ken, JP;
Alps Electric Co., Ltd., Tokyo, JP;
Other;
Abstract
A plasma processing apparatus has a plasma processing chamber having a plasma excitation electrode, a radiofrequency generator connected to the plasma excitation electrode, and a matching circuit for matching the impedance between the plasma processing chamber and the radiofrequency generator. The loss capacitance Cat a later time tafter delivery is measured between the plasma excitation electrode and ground potential positions which are grounded. The performance is evaluated by whether or not the loss capacitance Cis less than 26 times the plasma electrode capacitance Cat the later time tbetween the plasma excitation electrode and a counter electrode which cooperate with each other.