Akira Ishihara is a prominent inventor based in Tosu, Japan, known for his significant contributions to substrate processing technologies. With a total of eight patents to his name, Ishihara has made remarkable advancements in the field of semiconductor manufacturing.

Latest Patents

Ishihara's latest patents include a substrate processing method, a substrate processing apparatus, and a storage medium. The substrate processing method involves filling a chamber with a first gas and supplying a process liquid onto the surface of a wafer to process it. The process liquid discharged from the chamber is then returned to the process-liquid supplying part. Following this, the chamber is filled with a second gas, which has lower humidity than the first gas, allowing for the formation of a liquid film on the wafer's surface and drying it effectively. Additionally, his cleaning processing system and apparatus are designed to apply cleaning processes to substrates like semiconductor wafers. This system includes multiple process units for predetermined treatments, a wafer inversion unit, and a main wafer transfer mechanism.

Career Highlights

Ishihara has built a successful career at Tokyo Electron Limited, where he has been instrumental in developing innovative technologies that enhance semiconductor processing. His work has significantly impacted the efficiency and effectiveness of wafer processing techniques.

Collaborations

Ishihara has collaborated with notable colleagues, including Akira Yonemizu and Takanori Miyazaki, who have contributed to his projects and innovations in the field.

Conclusion

Akira Ishihara's contributions to substrate processing technologies have established him as a key figure in the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.

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