The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Oct. 04, 2007
Mitsunori Nakamori, Nirasaki, JP;
Yusuke Saito, Nirasaki, JP;
Akira Ishihara, Koshi, JP;
Satoru Tanaka, Koshi, JP;
Yuji Murakami, Koshi, JP;
Mitsunori Nakamori, Nirasaki, JP;
Yusuke Saito, Nirasaki, JP;
Akira Ishihara, Koshi, JP;
Satoru Tanaka, Koshi, JP;
Yuji Murakami, Koshi, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
At first, with a chamber being filled with a first gas, a process liquid is supplied onto a surface of a wafer in the chamber so as to process the surface of the wafer. At this time, the process liquid discharged from the chamber is returned to a process-liquid supplying part. Thereafter, with the chamber being filled with a second gas whose humidity is lower than that of the first gas, a fluid for forming a liquid film is supplied onto the surface of the wafer in the chamber to form a liquid film on the surface of the wafer and to dry the surface of the wafer.