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Akio Misaka

USPTO Granted Patents = 47 (Patent Applications = 1)

EPO Patents = 2

Average Co-Inventor Count = 1.3

ph-index = 9

Forward Citations = 662(Granted Patents)

Location History:

Hirakata, JP (1993)
Moriguchi, JP (1995)
Suita, JP (2006 - 2009)
Osaka, JP (1991 - 2013)
Toyama, JP (2014 - 2017)

Company Filing History:

23 out of 27,375

Matsushita Electric Industrial Co., Ltd.

20 out of 16,453

Panasonic Corporation

4 out of 13,307

Panasonic Intellectual Property Management Co., Ltd.

Years Active: 1991-2017

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Areas of Expertise:

Photomask

Pattern Formation

Semiconductor Device

Optical Proximity Correction

Mask Data Creation

LSI Pattern Design

Dry-Etching Process

Electron Beam Exposure

Patterning Method

Layout Design

Fabrication Method

47 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9658524 - Photomask, and method for creating pattern data thereof, and pattern forming method and processing method using photomask (2017-05-23),

2. 9507252 - Photomask and pattern forming method using photomask (2016-11-29),

3. 9291889 - Photo mask and method for forming pattern using the same (2016-03-22),

4. 9046783 - Photomask, and pattern formation method and exposure apparatus using the photomask (2015-06-02),

5. 8869079 - Semiconductor device and layout design method for the same (2014-10-21),

6. 8392856 - Semiconductor device and layout design method for the same (2013-03-05),

7. 8330248 - Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method (2012-12-11),

8. 8278014 - Photomask and pattern formation method using the same (2012-10-02),

9. 8095894 - Changing a design rule for forming LSI pattern based on evaluating effectiveness of optical proximity corrected patterns (2012-01-10),

10. 8007959 - Photomask and pattern formation method using the same (2011-08-30),

11. 7998641 - Photomask and pattern formation method using the same (2011-08-16),

12. 7914953 - Photomask and pattern formation method using the same (2011-03-29),

13. 7897298 - Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method (2011-03-01),

14. 7842436 - Photomask (2010-11-30),

15. 7790337 - Photomask, pattern formation method using the same and mask data creation method (2010-09-07),

Title: Akio Misaka - Innovative Inventor from Osaka

Introduction: Akio Misaka is a renowned inventor hailing from Osaka, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Akio Misaka holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous innovation and forward-thinking approach.

Career Highlights: With over two decades of experience in the tech industry, Akio Misaka has worked with leading research institutions and universities to develop cutting-edge solutions that have revolutionized the way we interact with technology.

Collaborations: Throughout his career, Akio Misaka has collaborated with top companies in Japan and internationally, fostering a culture of innovation and knowledge sharing to drive progress in the tech sector.

Conclusion: Akio Misaka's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor, shaping the future of technology in Japan and beyond.

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