The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Apr. 04, 2013
Applicant:
Panasonic Corporation, Osaka, JP;
Inventors:
Akio Misaka, Toyama, JP;
Masaru Sasago, Toyama, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/38 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01); G03F 7/70691 (2013.01);
Abstract
A photomask includes a translucent substrate; and a light-shielding film formed on the translucent substrate, and including a light-shielding portion and an opening which serves as a translucent region. A plurality of recesses are formed in a region of the translucent substrate, which is exposed from the opening. Widths of the plurality of recesses gradually increase with an increase in distances from a focal point so that light transmitted by the plurality of recesses is focused in a predetermined position.