The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Jul. 07, 2011
Shigeo Irie, Toyama, JP;
Akio Misaka, Osaka, JP;
Yuji Nonami, Kyoto, JP;
Tetsuya Nakamura, Toyama, JP;
Chika Harada, Osaka, JP;
Shigeo Irie, Toyama, JP;
Akio Misaka, Osaka, JP;
Yuji Nonami, Kyoto, JP;
Tetsuya Nakamura, Toyama, JP;
Chika Harada, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than the first dimension. A phase-shifting portion which transmits the exposing light in an opposite phase with respect to the first opening is formed on the transparent substrate around the first opening. A light-shielding portion is formed on the transparent substrate around the second opening.