Company Filing History:
Years Active: 2011-2012
Title: Chika Harada: Innovator in Photomask Technology
Introduction
Chika Harada is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of photomask technology, holding 2 patents that showcase her innovative spirit and technical expertise. Her work is instrumental in advancing the capabilities of photomasks used in various applications.
Latest Patents
One of her latest patents is focused on a photomask and pattern formation method. This invention includes a transparent substrate that possesses a transparent property against exposing light. It features a semi-light-shielding portion formed on the substrate, with a first opening having a specific dimension and a second opening that is larger than the first. Additionally, a phase-shifting portion transmits exposing light in an opposite phase with respect to the first opening, while a light-shielding portion is formed around the second opening. This innovative design enhances the functionality and precision of photomasks in various applications.
Career Highlights
Chika Harada is currently employed at Panasonic Corporation, where she continues to push the boundaries of technology. Her work at Panasonic has allowed her to collaborate with other talented professionals in the field, contributing to the company's reputation for innovation.
Collaborations
Chika has worked alongside notable colleagues such as Shigeo Irie and Akio Misaka. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Chika Harada is a remarkable inventor whose contributions to photomask technology are noteworthy. Her patents reflect her dedication to innovation and her role in advancing the field. Through her work at Panasonic Corporation, she continues to inspire future generations of inventors.