Toyama, Japan

Akihiko Yoneda

USPTO Granted Patents = 7 

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 2009-2021

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7 patents (USPTO):Explore Patents

Title: Akihiko Yoneda: Innovator in Substrate Processing Technology

Introduction

Akihiko Yoneda is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of substrate processing, holding a total of 7 patents. His innovative work focuses on enhancing the efficiency and reliability of substrate processing systems and apparatuses.

Latest Patents

Yoneda's latest patents include a substrate processing system and a substrate processing apparatus. The substrate processing system features a first controller that acquires event data during substrate transfer and alarm data during transfer errors. It also includes a recorder that captures the transfer operation as first image data while simultaneously recording higher resolution second image data. A second controller stores both types of image data based on the respective event and alarm data, allowing for a comprehensive display of the transfer operation. The substrate processing apparatus incorporates a data collection controller that manages monitoring item lists and component management information, ensuring effective maintenance and monitoring of the processing components.

Career Highlights

Throughout his career, Akihiko Yoneda has worked with notable companies such as Hitachi Kokusai Electric Inc. and Kokusai Electric Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in substrate processing technology.

Collaborations

Yoneda has collaborated with talented individuals in his field, including Tsukasa Iida and Kaori Inoshima. These partnerships have contributed to the advancement of his projects and the successful implementation of his patented technologies.

Conclusion

Akihiko Yoneda's contributions to substrate processing technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a valuable figure in the industry.

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