The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Nov. 19, 2004
Osamu Kasahara, Toyama, JP;
Kiyohiko Maeda, Toyama, JP;
Akihiko Yoneda, Toyama, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
At a time of a substrate loading step or/and at a time of a substrate unloading step, particles are effectively eliminated from a reaction chamber. Provided are a step of loading at least one waferinto a reaction chamber, a step of introducing reaction gas into the reaction chamber, and exhausting an inside of the reaction chamber, thereby processing the wafer, and a step of unloading the processed waferfrom the reaction chamber. In the step of loading the waferor/and in the step of unloading the wafer, the inside of the reaction chamberis exhausted at a larger exhaust flow rate than an exhaust flow rate in the step of processing the wafer