Kyoto, Japan

Akihiko Morita


Average Co-Inventor Count = 3.0

ph-index = 11

Forward Citations = 1,765(Granted Patents)


Location History:

  • Kamikyo-ku, JP (2005)
  • Kyoto, JP (1998 - 2020)

Company Filing History:


Years Active: 1998-2020

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15 patents (USPTO):Explore Patents

Title: Akihiko Morita: Innovator in Substrate Processing Technology

Introduction

Akihiko Morita is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 15 patents. His innovative work has advanced the capabilities of various devices used in the semiconductor industry.

Latest Patents

Among his latest patents is a filter coupling device designed to enhance the efficiency of filter connections. This device features multiple joint members that connect to various openings of the filter, along with an arrangement switcher that allows for the switching of joint member arrangements. Another notable patent is for a substrate treating apparatus, which includes an entire region exposure unit. This apparatus utilizes a local transfer mechanism equipped with a local transfer hand to hold substrates with resist films. The light-emitting device attached to the mechanism emits strip-shaped light to modify the resist film as the substrate moves horizontally.

Career Highlights

Throughout his career, Akihiko Morita has worked with esteemed companies such as Dainippon Screen Manufacturing Co., Ltd. and Screen Semiconductor Solutions Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in substrate processing.

Collaborations

He has collaborated with notable coworkers, including Masami Ohtani and Joichi Nishimura, who have also played significant roles in advancing technology in their respective fields.

Conclusion

Akihiko Morita's innovative contributions to substrate processing technology and his extensive patent portfolio highlight his importance in the industry. His work continues to influence advancements in semiconductor manufacturing processes.

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