The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2008

Filed:

May. 03, 2006
Applicants:

Akihiko Morita, Kyoto, JP;

Shigehiro Goto, Kyoto, JP;

Keiji Matsuchika, Kyoto, JP;

Inventors:

Akihiko Morita, Kyoto, JP;

Shigehiro Goto, Kyoto, JP;

Keiji Matsuchika, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/68 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate heat treatment apparatus for heat-treating a substrate includes a bake plate having projections on an upper surface thereof, a seal unit disposed peripherally of the upper surface of the bake plate for closing a lateral area of a minute space formed between a lower surface of the substrate and the upper surface of the bake plate when the substrate is placed on the bake plate, and exhaust bores for exhausting gas from the minute space. The substrate placed on the bake plate is heat-treated in a state of the gas exhausted from the minute space through the exhaust bores.

Published as:
CN1862204A; KR20060117249A; JP2006319093A; US2006289432A1; KR100750630B1; TW200735219A; US7432476B2; TWI307926B; CN100536074C; JP4666473B2;

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