Kyoto, Japan

Keiji Matsuchika


Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 1,489(Granted Patents)


Company Filing History:


Years Active: 2008-2013

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4 patents (USPTO):Explore Patents

Title: Keiji Matsuchika: Innovator in Substrate Heat Treatment Technology

Introduction

Keiji Matsuchika is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate heat treatment technology. With a total of 4 patents to his name, Matsuchika has developed innovative solutions that enhance the efficiency of heat treatment processes.

Latest Patents

One of Matsuchika's latest inventions is a substrate heat treatment apparatus that features a heat-treating plate with a flat upper surface. This apparatus includes support devices made of heat-resistant resin that contact and support the substrate. A unique seal device is arranged annularly to create a gastight space between the substrate and the heat-treating plate. The design incorporates exhaust bores for gas removal, which allows for effective heat treatment while minimizing variations in heat history across the substrate's surface.

Another notable patent by Matsuchika is also a substrate heat treatment apparatus. This design includes a heat-treating plate with support elements that project from its upper surface. The support elements are strategically located at the apexes of equilateral triangles, forming a minute space between the substrate and the plate. This space is sealed by a sealer, and the substrate is held in place by creating a negative pressure in the space through exhaust bores. This innovative arrangement efficiently inhibits sagging of the substrate, ensuring uniform treatment.

Career Highlights

Matsuchika has dedicated his career to advancing technology in substrate heat treatment. His work at Dainippon Screen Mfg. Co., Ltd. has positioned him as a key figure in the industry. His inventions have not only improved manufacturing processes but have also contributed to the overall efficiency of semiconductor production.

Collaborations

Throughout his career, Matsuchika has collaborated with notable colleagues, including Shigehiro Goto and Akihiko Morita. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Keiji Matsuchika's innovative contributions to substrate heat treatment technology have made a significant impact on the industry. His patents reflect a commitment to enhancing efficiency and effectiveness in manufacturing processes. As he continues to develop new technologies, Matsuchika remains a vital figure in the world of innovation.

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