The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Aug. 07, 2003
Masakazu Sanada, Kamikyo-ku, JP;
Masahiko Harumoto, Kamikyo-ku, JP;
Hiroshi Kobayashi, Kamikyo-ku, JP;
Minobu Matsunaga, Kamikyo-ku, JP;
Akihiko Morita, Kamikyo-ku, JP;
Masakazu Sanada, Kamikyo-ku, JP;
Masahiko Harumoto, Kamikyo-ku, JP;
Hiroshi Kobayashi, Kamikyo-ku, JP;
Minobu Matsunaga, Kamikyo-ku, JP;
Akihiko Morita, Kamikyo-ku, JP;
Abstract
A substrate (SW) is rotatably held in an approximately horizontal position by a wafer holding and rotation mechanism (). One end of a rinsing liquid supply nozzle () is rotatably supported by a rinsing liquid supply nozzle rotation supporting mechanism () to pass over the substrate (SW). In response to rotation of the rinsing liquid supply nozzle (), the rotation axis of the rinsing liquid supply nozzle () moves in a direction closer to or away from the rotation axis of the substrate (SW), whereby the amount of projection of a tip portion of the rinsing liquid supply nozzle () is reduced.