The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2015

Filed:

Mar. 18, 2013
Applicants:

Kazuhiro Nishimura, Kyoto, JP;

Akihiko Morita, Kyoto, JP;

Yukihiko Inagaki, Kyoto, JP;

Inventors:

Kazuhiro Nishimura, Kyoto, JP;

Akihiko Morita, Kyoto, JP;

Yukihiko Inagaki, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/52 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2012 (2013.01); G03F 7/0035 (2013.01); G03F 7/38 (2013.01);
Abstract

In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.


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