Location History:
- Kanagawa, JP (2002 - 2003)
- Sagamihara, JP (2006)
- Niigata, JP (2013)
Company Filing History:
2 out of 189 
1 out of 13,402 
1 out of 22 Years Active: 2002-2013
Title: Exploring the Innovations of Akihiko Kobayashi
Introduction
Akihiko Kobayashi, an esteemed inventor based in Niigata, Japan, has made significant contributions to the field of semiconductor technology. With a total of four patents to his name, his work has focused on improving the manufacturing processes of silicon wafers, particularly through advanced thermal treatments.
Latest Patents
Kobayashi's latest innovations include a method for manufacturing single crystal silicon wafers derived from ingots grown by the Czochralski process, utilizing a rapid heating and cooling process. The method involves subjecting silicon wafers to high temperatures exceeding 1300°C but below 1380°C in an oxidizing gas atmosphere with a controlled oxygen partial pressure of at least 20%. This process results in high-quality wafers characterized by a defect-free region containing a high concentration of oxygen solid solution.
Another notable patent describes the fabrication of silicon single crystal wafers from nitrogen-doped silicon single crystals. This invention involves heat treatment at temperatures between 1100°C and 1300°C in a reducing or inert gas atmosphere. The resulting wafers are free from grown-in crystal defects and form oxygen precipitation bulk micro defects, making them suitable for semiconductor device applications.
Career Highlights
Throughout his career, Akihiko Kobayashi has held positions in renowned companies such as Toshiba Ceramics Co., Ltd. and Nissan Motor Company Limited. His expertise and innovative spirit have driven advancements in semiconductor manufacturing processes, helping to enhance the performance and quality of electronic components.
Collaborations
Kobayashi has collaborated with notable coworkers in the field, including Kazuhiko Kashima and Naoki Maruko. Together, they have contributed to various projects that have further refined and advanced semiconductor technologies. Their combined efforts and knowledge have played a crucial role in developing new solutions for challenges faced in silicon wafer production.
Conclusion
In summary, Akihiko Kobayashi is a distinguished inventor whose work has profoundly impacted the semiconductor industry. With a focus on improving manufacturing methodologies for silicon wafers, his patents reflect a commitment to innovation and excellence. As technologies continue to evolve, Kobayashi’s contributions will undoubtedly remain influential in shaping the future of semiconductor applications.