Dordrecht, Netherlands

Aernout Christiaan Zonnevylle


 

Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 39(Granted Patents)


Location History:

  • Utrecht, NL (2012 - 2017)
  • Dordrecht, NL (2014 - 2017)
  • Delft, NL (2016 - 2021)

Company Filing History:


Years Active: 2012-2021

Loading Chart...
Loading Chart...
7 patents (USPTO):Explore Patents

Title: **Aernout Christiaan Zonnevylle: Pioneer in Charged Particle Beam Technologies**

Introduction

Aernout Christiaan Zonnevylle is a distinguished inventor based in Dordrecht, Netherlands, known for his contributions to the field of charged particle beam technology. With a total of seven patents to his name, Zonnevylle has made significant advancements in methods and apparatuses for inspecting samples, particularly through the use of a plurality of charged particle beams.

Latest Patents

One of Zonnevylle's latest patents is titled "Apparatus and method for inspecting a sample using a plurality of charged particle beams". This innovative apparatus includes a sample holder designed to securely hold the sample being inspected. It features a multi-beam charged particle generator responsible for producing an array of primary charged particle beams. An electro-magnetic lens system directs these beams into an array of separate, focused beams on the sample. Additionally, the system includes a multi-pixel photon detector that captures photons generated by the interaction of the charged particle beams with the sample. An optical assembly then conveys these photons to distinct pixels or groups of pixels within the multi-pixel photon detector, enhancing the capabilities of sample inspection.

Career Highlights

Throughout his career, Zonnevylle has worked with reputable companies, including Delmic B.V. and Mapper Lithography IP B.V., where he has applied his expertise in charged particle technology to develop innovative solutions. His work has significantly influenced the precision and efficiency of sample inspection processes in various scientific and industrial applications.

Collaborations

Zonnevylle has collaborated with notable coworkers, including Pieter Kruit and Jacob Pieter Hoogenboom. Together, they have driven forward the research and application of charged particle beam technologies, fostering advancements that contribute to the progress of the field.

Conclusion

Aernout Christiaan Zonnevylle's innovative spirit and expertise have led to significant advancements in the realm of charged particle beam technologies. His contributions through various patents demonstrate his commitment to improving sample inspection methods and reflect his prominent role within the scientific community. As he continues to develop and refine his inventions, Zonnevylle remains a key figure in the ongoing evolution of this critical technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…