The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 2017

Filed:

Apr. 02, 2013
Applicants:

Delmic B.v., JD Delft, NL;

Jacob Pieter Hoogenboom, De Meern, NL;

Pieter Kruit, Delft, NL;

Nalan M. SC Liv, Rotterdam, NL;

Aernout Christiaan Zonnevylle, Dordrecht, NL;

Inventors:

Jacob Pieter Hoogenboom, De Meern, NL;

Pieter Kruit, Delft, NL;

Nalan Liv, Rotterdam, NL;

Aernout Christiaan Zonnevylle, Dordrecht, NL;

Assignee:

DELMIC B.V., Delft, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); G01C 21/32 (2006.01); H01J 37/28 (2006.01); G01C 21/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G01C 21/32 (2013.01); H01J 37/22 (2013.01); H01J 37/226 (2013.01); H01J 37/228 (2013.01); H01J 37/28 (2013.01); G01C 21/3484 (2013.01); H01J 2237/221 (2013.01); H01J 2237/226 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/2806 (2013.01);
Abstract

An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.


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