The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2016

Filed:

Sep. 16, 2013
Applicant:

Delmic B.v., Delft, NL;

Assignee:

DELMIC B.V., Delft, NL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/21 (2006.01); H01J 37/02 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/023 (2013.01); H01J 37/222 (2013.01); H01J 37/228 (2013.01); H01J 37/28 (2013.01); H01J 2237/221 (2013.01); H01J 2237/2482 (2013.01); H01J 2237/2801 (2013.01); H01J 2237/2808 (2013.01);
Abstract

The present invention relates to a method for mutually aligning a scanning electron microscope SEM and a light microscope LM by creating a change () in the detected light signal of the light microscope LM by illuminating a substrate with an electron beam, correlating the position of the electron beam in the coordinate system of the scanning electron microscope SEM to the position of the observed change in the detected light signal in the coordinate system of the light microscope LM, and relatively shifting the scanning electron microscope SEM and the light microscope LM with respect to one another to a desired relative position of the coordinate systems ().


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