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Rotterdam, Netherlands

Nearfield Instruments B.v.

USPTO Granted Patents = 11

EPO Patents = 3

Forward Citations = 0

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16 inventors (with patents filed for the assignee):

Hamed Sadeghian Marnani (9 out of 9 patents)

Arseniy Kalinin (3 out of 3 patents)

Jakob Van De Laar (2 out of 12 patents)

4. Paul Zabbal (2 out of 2 patents)

5. Servaas Louis Bank (1 out of 2 patents)

6. Taras Piskunov (1 out of 1 patent)

7. Erik Tabak (1 out of 1 patent)

8. Kevin Henri Louis Makles (1 out of 1 patent)

9. Johannes Gradus Martinus Koers (1 out of 1 patent)

10. Wouter Arie De Zeeuw (1 out of 1 patent)

11. Jianfei Yang (1 out of 1 patent)

12. Taras Piskunov (1 out of 1 patent)

13. Ioan-Andrei Toacsen (1 out of 1 patent)

14. Chung Bin Chuang (1 out of 1 patent)

15. Daniele Piras (1 out of 1 patent)

11 patents: Sort by Forward Citations

1. 12761241 - Scanning probe microscopy system and method of operating such a system (2026-10-13),

2. 12730127 - Atomic force microscope (AFM) device and method of operating the same (2026-09-08),

3. 12724038 - Grid plate encoder based positioning system and method (2026-09-01),

4. 12618868 - Cassette for holding a probe (2026-05-05),

5. 12546800 - Automated landing method of a scanning probe microscopy system and scanning probe microscopy system using the same (2026-02-10),

6. 12529876 - Compact optical microscope, metrology device comprising the optical microscope and a wafer positioning metrology apparatus comprising the metrology device (2026-01-20),

7. 12523678 - Probe cassette and method for storing, transporting and handling one or more probe devices for a probe based system (2026-01-13),

8. 12523676 - Method of monitoring at least one of an overlay or an alignment between layers of a semiconductor substrate, scanning probe microscopy system and computer program (2026-01-13),

9. 12429496 - Arrangement for and method of determining cantilever deflection in a scanning probe microscopy system (2025-09-30),

10. 12346036 - Alignment system and method for aligning an object having an alignment mark (2025-07-01),

11. 12123895 - Method of determining dimensions of features of a subsurface topography, scanning probe microscopy system and computer program (2024-10-22),

Company Overview

Nearfield Instruments B.V. is a technology company based in Rotterdam, Netherlands, specializing in advanced measurement solutions for nanoscale applications. The organization focuses on developing innovative instruments that enable high-resolution imaging and analysis at the atomic level, catering to research and industrial sectors. Their expertise spans various domains, including nanotechnology and materials science, providing essential tools for scientists and engineers to explore and manipulate materials with unprecedented precision.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

11 Patents

#13 in Rotterdam

#569 in Netherlands

#51,761 in the World

Rotterdam, Netherlands

Nearfield Instruments B.v.

Forward Citations = 0

16 inventors:

Hamed Sadeghian Marnani (9 out of 9 patents)

Arseniy Kalinin (3 out of 3 patents)

Jakob Van De Laar (2 out of 12 patents)

4. Paul Zabbal (2 out of 2 patents)

5. Servaas Louis Bank (1 out of 2 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Nearfield Instruments B.v.. Retrieved from https://idiyas.com/company/nearfield-instruments-b-v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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