For the Inventor, By the Inventor

Enter assignee name

Morrisville, PA, United States of America

Gelest, Inc.

USPTO Granted Patents = 43

% Expired Patents = 2.3

EPO Patents = 8

Forward Citations = 411

Loading Chart...

Loading Chart...

24 inventors (with patents filed for the assignee):

Barry C Arkles (34 out of 90 patents)

Alain E Kaloyeros (14 out of 21 patents)

Youlin Pan (10 out of 28 patents)

4. Li Yang (6 out of 6 patents)

5. Jonathan D Goff (5 out of 14 patents)

6. Yuta Hioki (3 out of 7 patents)

7. Gerald L Larson (3 out of 16 patents)

8. Kerry Campbell Demella (2 out of 2 patents)

9. Fernando Jove (2 out of 6 patents)

10. Benigno A Janeiro (2 out of 4 patents)

11. Richard J Liberatore (2 out of 2 patents)

12. Hiroshi Fukui (2 out of 4 patents)

13. Alison Ane Phillips (1 out of 1 patent)

14. Ferdinand Gonzaga (1 out of 2 patents)

15. Taewoo Min (1 out of 2 patents)

Core Competencies:

Silicon Carbide

Thin Film Deposition

Alkyl Tin Compounds

Vapor Phase

Patterned Substrate

Chemical Vapor Deposition

Silicon Nitride

Organotin Compounds

Tantalum Films

Hydridosilapyrroles

Chalcogenosilacyclopentanes

Siloxane Polymers

43 patents: Sort by Forward Citations

1. 12716492 - Bonding structure, metal gasket or metal o-ring used therein, and container, pipe, and organotin compound manufacturing apparatus having the same (2026-08-25),

2. 12703713 - Tin compound and resist solution using the same, pattern forming method, thin film, patterned thin film, and method for producing tin compound (2026-08-11),

3. 12606577 - Iodoalkyl tin compounds and preparation methods thereof (2026-04-21),

4. 12581710 - Manufacturing method of patterning substrate, patterned substrate, and intermediate patterned substrate (2026-03-17),

5. 12545693 - Method of storing high purity alkyl tin compounds (2026-02-10),

6. 12545692 - High purity alkyl tin compounds and manufacturing methods thereof (2026-02-10),

7. 12381076 - Inherent area selective deposition of silicon-containing dielectric on metal substrate (2025-08-05),

8. 12378666 - Silicon carbide thin films and vapor deposition methods thereof (2025-08-05),

9. 12344934 - Silicon-based thin films from N-alkyl substituted perhydridocyclotrisilazanes (2025-07-01),

10. 12171863 - Compositions and methods for reshaping keratin-rich substrates and forming adherent flexible films (2024-12-24),

11. 12145955 - Cyclic azastannane and cyclic oxostannane compounds and methods for preparation thereof (2024-11-19),

12. 12065737 - Silicon-based thin films from N-alkyl substituted perhydridocyclotrisilazanes (2024-08-20),

13. 12060377 - High purity tin compounds containing unsaturated substituent and method for preparation thereof (2024-08-13),

14. 12060373 - Chalcogenosilacyclopentanes (2024-08-13),

15. 11987882 - Silicon carbide thin films and vapor deposition methods thereof (2024-05-21),

Company Overview

Gelest, Inc. is a leading provider of specialty chemicals and materials, focusing on silanes, siloxanes, and metal-organic compounds. The company serves diverse industries, including electronics, pharmaceuticals, and advanced materials, by developing innovative solutions tailored to specific application needs. With a strong emphasis on research and development, Gelest is committed to advancing technology in areas such as surface modification, adhesion, and nanotechnology, positioning itself as a key player in the chemical manufacturing landscape.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

43 Patents

#1 in Morrisville, PA

#301 in Pennsylvania

#8,099 in US

#16,040 in the World

Morrisville, PA, United States of America

Gelest, Inc.

Forward Citations = 411

24 inventors:

Barry C Arkles (34 out of 90 patents)

Alain E Kaloyeros (14 out of 21 patents)

Youlin Pan (10 out of 28 patents)

4. Li Yang (6 out of 6 patents)

5. Jonathan D Goff (5 out of 14 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Gelest, Inc.. Retrieved from https://idiyas.com/company/gelest

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

Loading…