Philadelphia, PA, United States of America

Richard J Liberatore

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: Innovations of Richard J Liberatore

Introduction

Richard J Liberatore is a notable inventor based in Philadelphia, PA. He has made significant contributions to the field of chemistry, particularly in the development of new compounds. With a total of two patents to his name, his work continues to influence various applications in material science.

Latest Patents

Liberatore's latest patents focus on a new class of compounds known as chalcogenosilacyclopentanes. These compounds are characterized by five-membered ring structures that contain silicon-selenium or silicon-tellurium bonds. The substituents on the silicon and on the ring carbons can include hydrogen, alkyl, alkoxy, aromatic, or ether groups. The chalcogenosilacyclopentane compounds are notable for their ability to undergo ring-opening reactions with hydroxyl and other protic functionalities. This property makes them suitable for preparing substrates that can be utilized in thin film deposition techniques such as Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD).

Career Highlights

Richard J Liberatore is currently associated with Gelest, Inc., a company known for its innovative chemical solutions. His work at Gelest has allowed him to explore and develop advanced materials that have practical applications in various industries.

Collaborations

Throughout his career, Liberatore has collaborated with esteemed colleagues such as Barry C Arkles and Youlin Pan. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in his field.

Conclusion

Richard J Liberatore's contributions to the field of chemistry, particularly through his patents on chalcogenosilacyclopentanes, highlight his innovative spirit and dedication to advancing material science. His work continues to pave the way for new applications and technologies.

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