The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Jun. 02, 2023
Gelest, Inc., Morrisville, PA (US);
Mitsubishi Chemical Corporation, Tokyo, JP;
Li Yang, Belle Mead, NJ (US);
Yuta Hioki, Toyota, JP;
GELEST, INC., Morrisville, PA (US);
MITSUBISHI CHEMICAL CORPORATION, Tokyo, JP;
Abstract
Monoalkyl tin triamide compounds having purity of at least about 99 mol % and the chemical formula RSn(NMe)are described. Ris selected from R, R, and R; Ris a primary alkyl group having about 1 to 10 carbon atoms, Ris a secondary alkyl group having about 3 to 10 carbon atoms, and Ris a tertiary alkyl group having about 3 to 10 carbon atoms; each Ris independently an alkyl group having about 1 to 10 carbon atoms; and a content of RSn(NR)(N(R)CHNR) is less than about 1 mol %. Methods for synthesizing, purifying, and storing these compounds are also provided. The monoalkyl tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of dialkyl tin and other tin impurities.