Forward Citations = 3

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1 inventor (with patents filed for the assignee):

Mitsuhiko Ogihara (7 out of 96 patents)

7 patents: Sort by Forward Citations

1. 12183636 - Semiconductor substrate, method for manufacturing semiconductor substrate and method for manufacturing semiconductor device (2024-12-31),

2. 12136569 - Semiconductor device manufacturing method and semiconductor device manufacturing system (2024-11-05),

3. 12068166 - Semiconductor substrate (2024-08-20),

4. 11894272 - Semiconductor substrate, method for manufacturing semiconductor substrate and method for manufacturing semiconductor device (2024-02-06),

5. 11798805 - Method for manufacturing semiconductor device and semiconductor substrate (2023-10-24),

6. 11670514 - Method for manufacturing semiconductor device and semiconductor substrate (2023-06-06),

7. 11152216 - Method for manufacturing semiconductor device (2021-10-19),

Company Overview

Filnex Inc. is a leading provider of innovative filtration solutions for a wide range of industries. From air and water filtration to industrial processes, Filnex offers a comprehensive line of high-quality filtration products designed to meet the needs of our customers. With a focus on quality, reliability, and customer satisfaction, Filnex is committed to delivering exceptional filtration solutions that ensure the safety and efficiency of your operations.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

7 Patents

#2,287 in Tokyo

#5,456 in Japan

Tokyo, Japan

Filnex Inc.

Forward Citations = 3

1 inventor:

Mitsuhiko Ogihara (7 out of 96 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Filnex Inc.. Retrieved from https://idiyas.com/company/filnex

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]