The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2023

Filed:

Mar. 25, 2021
Applicant:

Filnex Inc., Tokyo, JP;

Inventor:

Mitsuhiko Ogihara, Tokyo, JP;

Assignee:

Filnex Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/683 (2006.01); H01L 21/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02444 (2013.01); H01L 21/6835 (2013.01); H01L 21/7806 (2013.01);
Abstract

A method for manufacturing a semiconductor device and a semiconductor substrate are provided. A method for manufacturing a semiconductor device includes the steps of forming a bonding layer that bonds a semiconductor thin film to a bonding layer region on a portion of a first substrate with a force weaker than covalent bonding, forming the semiconductor thin film in the bonding layer region and a non-bonding layer region other than the bonding layer region, separating the semiconductor thin film from the first substrate by bonding an organic layer included in a pick-up substrate different from the first substrate to the semiconductor thin film, removing the bonding layer adhered to a peeled surface of the semiconductor thin film separated from the first substrate, and bonding the semiconductor thin film from which the bonding layer has been removed to a second substrate different from the first substrate.


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