% Expired Patents = 100.0

Forward Citations = 23

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6 inventors (with patents filed for the assignee):

Alexei Maznev (4 out of 4 patents)

Alexander Mazurenko (2 out of 3 patents)

Peter Rosenthal (1 out of 8 patents)

4. Carlos A Duran (1 out of 1 patent)

5. Michael Gostein (1 out of 1 patent)

6. Zhuoyun Li (1 out of 1 patent)

4 patents: Sort by Forward Citations

1. 7839509 - Method of measuring deep trenches with model-based optical spectroscopy (2010-11-23),

2. 7499183 - Method of measuring sub-micron trench structures (2009-03-03),

3. 7365864 - Method of determining properties of patterned thin film metal structures using transient thermal response (2008-04-29),

4. 7327468 - Opto-acoustic apparatus with optical heterodyning for measuring solid surfaces and thin films (2008-02-05),

Company Overview

Advanced Metrology Systems LLC is a leading provider of high-tech metrology solutions for industries such as aerospace, automotive, and medical. Our advanced measuring systems ensure precision and accuracy in manufacturing processes, helping our clients achieve superior quality and efficiency. With a team of experienced engineers and state-of-the-art technology, we are dedicated to delivering innovative metrology solutions tailored to our customers' specific needs.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

4 Patents

#38 in Natick, MA

#3,312 in Massachusetts

#60,597 in US

Natick, MA, United States of America

Advanced Metrology Systems LLC

Forward Citations = 23

6 inventors:

Alexei Maznev (4 out of 4 patents)

Alexander Mazurenko (2 out of 3 patents)

Peter Rosenthal (1 out of 8 patents)

4. Carlos A Duran (1 out of 1 patent)

5. Michael Gostein (1 out of 1 patent)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Advanced Metrology Systems LLC. Retrieved from https://idiyas.com/company/advanced-metrology-systems

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]