Canton, NY, United States of America

Carlos A Duran


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations of Carlos A Duran

Introduction

Carlos A Duran is an accomplished inventor based in Canton, NY (US). He has made significant contributions to the field of optical spectroscopy, particularly in the measurement of semiconductor wafers. His innovative approach has led to advancements that enhance the accuracy and efficiency of trench measurements.

Latest Patents

Carlos holds a patent for a "Method of measuring deep trenches with model-based optical spectroscopy." This invention represents an improved method of measuring trenches on semiconductor wafers using optical spectroscopy. The described method allows for the characterization of both the depth and shape of the trench. The advancement is achieved through improved Effective Medium Approximation-based modeling of the optical response of trench structures. He has 1 patent to his name.

Career Highlights

Carlos is currently associated with Advanced Metrology Systems LLC, where he applies his expertise in optical measurement techniques. His work has been pivotal in developing methods that enhance the precision of semiconductor manufacturing processes.

Collaborations

Carlos has collaborated with notable colleagues, including Peter Rosenthal and Alexei Maznev. Their combined efforts have contributed to the advancement of optical measurement technologies.

Conclusion

Carlos A Duran's innovative work in optical spectroscopy has significantly impacted the semiconductor industry. His contributions continue to pave the way for more accurate measurement techniques, showcasing the importance of innovation in technology.

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