Natick, MA, United States of America

Alexei Maznev


Average Co-Inventor Count = 1.9

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Natick, RU (2008)
  • Natick, MA (US) (2008 - 2010)

Company Filing History:


Years Active: 2008-2010

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4 patents (USPTO):Explore Patents

Title: Alexei Maznev: Innovator in Optical Spectroscopy

Introduction

Alexei Maznev is a prominent inventor based in Natick, MA (US), known for his contributions to the field of optical spectroscopy. With a total of 4 patents to his name, he has made significant advancements in measuring trench structures on semiconductor wafers.

Latest Patents

Maznev's latest patents include a method for measuring deep trenches with model-based optical spectroscopy. This invention represents an improved technique for characterizing not only the depth but also the shape of trenches on semiconductor wafers. The advancement is achieved through enhanced Effective Medium Approximation-based modeling of the optical response of trench structures. Another notable patent is the method of measuring sub-micron trench structures, which utilizes ISTS to measure trenches with near- or sub-micron width. This method involves exciting the structure with a spatially periodic laser intensity pattern to generate surface acoustic waves, followed by detecting the signal beam to determine properties of the trench structures.

Career Highlights

Maznev is currently associated with Advanced Metrology Systems LLC, where he applies his expertise in optical measurement techniques. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include Alexander Mazurenko and Zhuoyun Li, who have collaborated with him on various projects related to optical spectroscopy and trench measurement techniques.

Conclusion

Alexei Maznev's innovative work in optical spectroscopy and trench measurement has significantly impacted the semiconductor industry. His contributions continue to pave the way for advancements in measurement techniques and semiconductor technology.

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