The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Dec. 26, 2016
Applied Materials Israel Ltd., Rehovot, IL;
Yakov Weinberg, Modi'in, IL;
Ishai Schwarzband, Or-Yehuda, IL;
Roman Kris, Jerusalem, IL;
Itay Zauer, Rehovot, IL;
Ran Goldman, Hod Hasharon, IL;
Olga Novak, Tel Aviv, IL;
Dhananjay Singh Rathore, Boise, ID (US);
Ofer Adan, Rehovot, IL;
Shimon Levi, Tivon, IL;
Applied Materials Israel Ltd., Rehovot, IL;
Abstract
A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.