Boise, ID, United States of America

Dhananjay Singh Rathore

This inventor holds 4 USPTO granted patents. Top assignee: Applied Materials Israel Limited. Active years: 2016-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dhananjay Singh Rathore. Retrieved from https://idiyas.com/inventor/dhananjay-singh-rathore

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.4

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2016-2021

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4 patents (USPTO):Explore Patents

Title: Innovations by Dhananjay Singh Rathore

Introduction

Dhananjay Singh Rathore is an accomplished inventor based in Boise, Idaho. He has made significant contributions to the field of technology, particularly in the development of advanced systems for evaluating and measuring multilayer structures. With a total of four patents to his name, Rathore's work is at the forefront of innovation in the semiconductor industry.

Latest Patents

Rathore's latest patents include two notable inventions. The first patent focuses on an evaluation system designed to assess a hole formed in an intermediate product. This system incorporates an imager and a processing circuit. The imager is configured to capture an electron image of a hole created by an etch process, which exposes at least one layer of a set of layers that differ by their electron yield. The processing circuit evaluates whether the hole reaches a target layer of the intermediate product, which is essential in the manufacturing process of three-dimensional NAND memory units. The hole exhibits a high aspect ratio and has a width on a nanometric scale.

The second patent presents a technique for measuring overlay between layers of a multilayer structure. This method involves obtaining an image representing the multilayer structure and expected images for its layers. By combining these expected images, the method performs registration and segmentation of the given image, producing segmented images and maps of the layers. This process allows for the determination of overlay between any two selected layers by analyzing the maps alongside the expected images.

Career Highlights

Dhananjay Singh Rathore is currently employed at Applied Materials Israel Limited, where he continues to innovate and contribute to the field of semiconductor technology. His expertise in evaluating and measuring multilayer structures has positioned him as a key player in the industry.

Collaborations

Rathore has collaborated with notable colleagues, including Roman Kris and Yakov Weinberg, further enhancing the impact of his work in the field.

Conclusion

Dhananjay Singh Rathore's contributions to technology through his patents and work at Applied Materials Israel Limited highlight his role as a leading inventor in the semiconductor industry. His innovative approaches to evaluating and measuring multilayer structures are paving the way for advancements in memory unit manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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