The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Aug. 24, 2016
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Chih-Tsung Shih, Hsinchu, TW;

Tien-Hsi Lee, Zhongli, TW;

Chia-Jen Chen, Jhudong Township, TW;

Shang-Chieh Chien, New Taipei, TW;

Shinn-Sheng Yu, Hsinchu, TW;

Jeng-Horng Chen, Hsin-Chu, TW;

Anthony Yen, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/64 (2012.01); G03F 1/62 (2012.01); B29C 71/02 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01); B29C 71/02 (2013.01); G03F 1/62 (2013.01); G03F 7/2002 (2013.01); B29C 2071/022 (2013.01);
Abstract

The present disclosure relates to an extreme ultraviolet (EUV) pellicle having a pellicle film connected to a pellicle frame. In some embodiments, the EUV pellicle has a substrate, and an adhesive material disposed onto the substrate. A pellicle frame is connected to the substrate by way of the adhesive material. The pellicle frame is configured to mount the substrate to an extreme ultraviolet (EUV) reticle.


Find Patent Forward Citations

Loading…