Location History:
- Taipei, TW (2012 - 2016)
- Zhongli, TW (2016 - 2017)
Company Filing History:
3 out of 40,850 
1 out of 832,880 Years Active: 2012-2017
Title: The Innovative Mind of Tien-Hsi Lee
Introduction
Tien-Hsi Lee, an accomplished inventor based in Zhongli, Taiwan, has made significant contributions to the field of extreme ultraviolet (EUV) technology. With a total of 4 patented inventions, Lee has demonstrated a strong commitment to advancing the capabilities of EUV photolithography, a critical process in semiconductor manufacturing.
Latest Patents
Among his latest innovations, Tien-Hsi Lee has developed a method of making an extreme ultraviolet pellicle. This innovative pellicle features a pellicle film that is connected to a pellicle frame. In specific embodiments, the EUV pellicle includes a substrate with an adhesive material applied, allowing the pellicle frame to be securely attached to the substrate. This design enables the pellicle to be mounted onto an EUV reticle efficiently.
Another significant patent relates to the method of making an extreme ultraviolet pellicle. Lee's method is groundbreaking as it forms a cleaving plane within a substrate, allowing a pellicle frame to be attached to the upper surface. By cleaving along this plane, a pellicle film is created, eliminating the need for a supportive mesh. This innovation prevents potential interferences from a support structure that could hinder EUV radiation and lead to substantial non-uniformities in intensity.
Career Highlights
Tien-Hsi Lee's career is marked by his work at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a front-runner in the semiconductor industry. At TSMC, Lee has honed his expertise in EUV technology and positioning himself as a valuable asset in driving innovations that optimize manufacturing processes.
Collaborations
Throughout his career, Tien-Hsi Lee has collaborated with notable colleagues, including Chih-Tsung Shih and Chia-Jen Chen. These partnerships reflect a network of skilled professionals dedicated to pushing the boundaries of technology in the semiconductor industry.
Conclusion
In conclusion, Tien-Hsi Lee's contributions to the field of extreme ultraviolet technology through his innovative patents underscore his role as a pivotal inventor in the semiconductor landscape. His relentless pursuit of excellence continues to inspire collaborations and advancements, paving the way for future technologies.