The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2016
Filed:
Jul. 25, 2013
Taiwan Semiconductor Manufacturing Company Limited, Hsin-Chu, TW;
Chun-Hsien Lin, Hsin-chu, TW;
Liu Bo-Tsun, Taipei, TW;
Chin-Ti Ko, Zhudong Township, TW;
Wu Cheng-Hung, Hsinchu, TW;
Kuo-Hung Chao, Hsinchu, TW;
Peng Jui-Chun, Hsinchu, TW;
Fei-Gwo Tsai, Taipei, TW;
Heng-Hsin Liu, New Taipei, TW;
Jong-I Mou, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED, Hsin-Chu, TW;
Abstract
Among other things, systems and techniques are provided for detecting defects on a wafer based upon non-correctable error data yielded from a scan of the wafer to determine a topology of the wafer. The non-correctable error data is reconstructed to generate a non-correctable error image map, which is transformed to generate a projection. In some embodiments, the non-correctable error image map is transformed via a feature extraction transform such as a Hough transform or a Radon transform. In some embodiments, the projection is compared to a set of rules to identify a signature in the non-correctable error image map indicative of a defect.