The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
Oct. 16, 2014
Applicant:
Cabot Microelectronics Corporation, Aurora, IL (US);
Inventors:
Ching-Ming Tsai, Jhudong Township, TW;
Shi-Wei Cheng, Taoyuan, TW;
Jia-Cheng Hsu, Tainan, TW;
Kun-Shu Yang, Hsinchu, TW;
Hui-Feng Chen, Hsinchu, TW;
Gregory Gaudet, Newark, IL (US);
Sheng-Huan Liu, Taoyuan Hsien, TW;
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/26 (2012.01);
U.S. Cl.
CPC ...
B24B 37/26 (2013.01);
Abstract
The invention provides a polishing pad and a method of using the polishing pad for chemically-mechanically polishing a substrate. The polishing pad comprises at least a grooved region and an exclusion region, wherein the exclusion region is adjacent to the circumference of the polishing pad, and wherein the exclusion region is devoid of grooves.