The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

Jul. 15, 2013
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chen-Hua Yu, Hsinchu, TW;

Hung-Pin Chang, Taipei County, TW;

Yung-Chi Lin, Su-Lin, TW;

Chia-Lin Yu, Sigang Township, TW;

Jui-Pin Hung, Hsinchu, TW;

Chien Ling Hwang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01); H01L 33/00 (2010.01); H01L 21/683 (2006.01); H01L 23/48 (2006.01); H01L 33/48 (2010.01); H01L 33/62 (2010.01); H01L 33/64 (2010.01); H01L 21/768 (2006.01); H01L 21/48 (2006.01); H01L 23/14 (2006.01); H01L 23/498 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 33/005 (2013.01); H01L 21/6835 (2013.01); H01L 21/76877 (2013.01); H01L 23/481 (2013.01); H01L 33/486 (2013.01); H01L 33/62 (2013.01); H01L 33/641 (2013.01); H01L 21/486 (2013.01); H01L 21/76843 (2013.01); H01L 23/147 (2013.01); H01L 23/49827 (2013.01); H01L 24/29 (2013.01); H01L 24/48 (2013.01); H01L 24/49 (2013.01); H01L 24/97 (2013.01); H01L 2221/68345 (2013.01); H01L 2221/68359 (2013.01); H01L 2224/16 (2013.01); H01L 2224/32225 (2013.01); H01L 2224/32506 (2013.01); H01L 2224/48091 (2013.01); H01L 2224/48227 (2013.01); H01L 2224/48233 (2013.01); H01L 2224/49113 (2013.01); H01L 2224/73265 (2013.01); H01L 2224/97 (2013.01); H01L 2924/01019 (2013.01); H01L 2924/01029 (2013.01); H01L 2924/01078 (2013.01); H01L 2924/01079 (2013.01); H01L 2924/01322 (2013.01); H01L 2924/04941 (2013.01); H01L 2924/12041 (2013.01); H01L 2924/19041 (2013.01); H01L 2933/0066 (2013.01);
Abstract

A method of making a semiconductor device, the method includes forming a first opening and a second opening in a substrate. The method further includes forming a conductive material in the first opening and in the second opening, the conductive material comprising a joined portion where the conductive material in the first opening and the conductive material in the second opening are electrically and thermally connected together at a first surface of the substrate. The method further includes reducing a thickness of the substrate from a second surface of the substrate, opposite the first surface, to expose the conductive material in the first opening and the conductive material in the second opening. The method further includes connecting a device to the second surface of the substrate.


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