The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
Jan. 28, 2015
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Zhaohui Cheng, Tokyo, JP;
Hideo Kashima, Tokyo, JP;
Hiroaki Baba, Tokyo, JP;
Takeyoshi Ohashi, Tokyo, JP;
Tomonori Nakano, Tokyo, JP;
Kotoko Urano, Tokyo, JP;
Naomasa Suzuki, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.