The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9046781 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 02, 2015

Filed:

Jul. 17, 2013
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chih-Tsung Shih, Hsinchu, TW;

Shinn-Sheng Yu, Hsinchu, TW;

Jeng-Horng Chen, Hsin-chu, TW;

Wei-Hung Liu, Hsinchu, TW;

Chia-Chen Chen, Hsinchu, TW;

Chi-Lun Lu, Hsinchu, TW;

Anthony Yen, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/22 (2012.01); G03F 1/24 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); G03F 7/20 (2013.01);
Abstract

The present disclosure provides an embodiment of a reflective mask that includes a substrate; a reflective multilayer formed on the substrate; a capping layer formed on the reflective multilayer and having a hardness greater than about 8; and an absorber layer formed on the capping layer and patterned according to an integrated circuit layout.


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Shih, Chih-Tsung. (2015). Structure and method for reflective-type mask (U.S. Patent No. 9046781). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9046781

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