Wei-Hung Liu

Title: Innovations of Wei-Hung Liu

Introduction

Wei-Hung Liu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of technology, particularly in semiconductor manufacturing and antenna design. With a total of 3 patents, Liu's work reflects his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is titled "Structure and method for reflective-type mask." This invention includes a substrate, a reflective multilayer formed on the substrate, an absorber layer patterned according to an integrated circuit layout, and a protection layer over the reflective multilayer within the openings. Another significant patent is for a "Loop antenna," which features a first loop section, a second loop section, and a third loop section. The design of the loop antenna allows for an empty area defined by the first loop section, with an annular groove formed between the first and second loop sections.

Career Highlights

Wei-Hung Liu has worked with prominent companies in the technology sector, including Taiwan Semiconductor Manufacturing Company Ltd. and Wistron Neweb Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Throughout his career, Liu has collaborated with talented individuals such as Chih-Tsung Shih and Chi-Lun Lu. These partnerships have contributed to the advancement of his projects and inventions.

Conclusion

Wei-Hung Liu's contributions to technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to inspire innovation and development in semiconductor technology and antenna design.