Taiwan Semiconductor Manufacturing Comp. Ltd.

Wistron Neweb Corporation

Wei-Hung Liu

Anthony Yen

Jeng-Horng Chen

Shinn-Sheng Yu

Chih-Tsung Shih

Chia-Chen Chen

Chi-Lun Lu

Liang-Kai Chen

Chih-Chun Peng

Chin-Shih Lu

Mei Tien

A reflective mask includes a substrate; a reflective multilayer formed on the substrate; an absorber layer formed on the reflective multilayer, wherein the absorber layer is patterned to have openings according to an integrated circuit layout; and a protection layer formed over the reflective multilayer within the openings.

Structure and method for reflective-type mask

A loop antenna is provided, which includes a first loop section, a second loop section and a third loop section. The first loop section surrounds and defines an empty area. The second loop section surrounds and connects the first loop section, and an annular groove is formed between the first loop section and the second loop section. The third loop section surrounds and connects the second loop section. The width of a gap between the third loop section and the second loop section is smaller than the width of the annular groove.

Loop antenna

The present disclosure provides an embodiment of a reflective mask that includes a substrate; a reflective multilayer formed on the substrate; a capping layer formed on the reflective multilayer and having a hardness greater than about 8; and an absorber layer formed on the capping layer and patterned according to an integrated circuit layout.

Growing community of inventors

Hsinchu, Taiwan

Wei-Hung Liu