The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2011
Filed:
May. 14, 2008
Richard Wallingford, San Jose, CA (US);
Stephanie Chen, Fremont, CA (US);
Jason Kirkwood, Santa Clara, CA (US);
Tao Luo, Fremont, CA (US);
Yong Zhang, Cupertino, CA (US);
Lisheng Gao, Morgan Hill, CA (US);
Richard Wallingford, San Jose, CA (US);
Stephanie Chen, Fremont, CA (US);
Jason Kirkwood, Santa Clara, CA (US);
Tao Luo, Fremont, CA (US);
Yong Zhang, Cupertino, CA (US);
Lisheng Gao, Morgan Hill, CA (US);
KLA-Tencor Corp., San Jose, CA (US);
Abstract
Computer-implemented methods, carrier media, and systems for selecting polarization settings for an inspection system for inspection of a layer of a wafer are provided. One method includes detecting a population of defects on the layer of the wafer using results of each of two or more scans of the wafer performed with different combinations of polarization settings of the inspection system for illumination and collection of light scattered from the wafer. The method also includes identifying a subpopulation of the defects for each of the different combinations, each of which includes the defects that are common to at least two of the different combinations, and determining a characteristic of a measure of signal-to-noise for each of the subpopulations. The method further includes selecting the polarization settings for the illumination and the collection to be used for the inspection corresponding to the subpopulation having the best value for the characteristic.