The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
May. 21, 2008
Gabor D. Toth, San Jose, CA (US);
Rudy F. Garcia, Union City, CA (US);
Chris Huang, Cupertino, CA (US);
Niles Kenneth Macdonald, San Jose, CA (US);
Mehran Nasser-ghodsi, Hamilton, MA (US);
Garrett Pickard, Mt. View, CA (US);
Khashayar Shadman, Mt. View, CA (US);
Wo-tak Wu, Cupertino, CA (US);
Ming Yu, Fremont, CA (US);
Gabor D. Toth, San Jose, CA (US);
Rudy F. Garcia, Union City, CA (US);
Chris Huang, Cupertino, CA (US);
Niles Kenneth MacDonald, San Jose, CA (US);
Mehran Nasser-Ghodsi, Hamilton, MA (US);
Garrett Pickard, Mt. View, CA (US);
Khashayar Shadman, Mt. View, CA (US);
Wo-Tak Wu, Cupertino, CA (US);
Ming Yu, Fremont, CA (US);
KLA-Tencor Corporation, San Jose, CA (US);
Abstract
A scanning electron beam apparatus with an Auger spectrometer. The apparatus includes at least an electron column for generating a primary electron beam, a magnetic objective lens configured to focus the primary electron beam onto a surface of a target substrate, and a spectrometer configured to detect Auger electrons emitted from the surface of the target substrate. The magnetic objective lens applies a magnetic field strength greater than 10 Gauss and less than 50 Gauss at the surface of the target substrate. Other embodiments, aspects and features are also disclosed.