The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Aug. 29, 2005
Nicolaas Rudolf Kemper, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Roelof Frederik DE Graaf, Veldhoven, NL;
Christian Alexander Hoogendam, Veldhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frits Van Der Meulen, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Franciscus Johannes Herman Maria Teunissen, Rotterdam, NL;
Jan-gerard Cornelis Van Der Toorn, Eindhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Marco Polizzi, Eindhoven, NL;
Edwin Augustinus Matheus Van Gompel, Veldhoven, NL;
Stefan Philip Christiaan Belfroid, Delft, NL;
Johannes Petrus Maria Smeulers, Zwijndrecht, NL;
Herman Vogel, Sandy Hook, CT (US);
Nicolaas Rudolf Kemper, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Roelof Frederik De Graaf, Veldhoven, NL;
Christian Alexander Hoogendam, Veldhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frits Van Der Meulen, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Franciscus Johannes Herman Maria Teunissen, Rotterdam, NL;
Jan-Gerard Cornelis Van Der Toorn, Eindhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Marco Polizzi, Eindhoven, NL;
Edwin Augustinus Matheus Van Gompel, Veldhoven, NL;
Stefan Philip Christiaan Belfroid, Delft, NL;
Johannes Petrus Maria Smeulers, Zwijndrecht, NL;
Herman Vogel, Sandy Hook, CT (US);
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.