The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Jun. 20, 2006
Seiji Katsuoka, Tokyo, JP;
Masahiko Sekimoto, Tokyo, JP;
Toshio Yokoyama, Tokyo, JP;
Teruyuki Watanabe, Tokyo, JP;
Takahiro Ogawa, Tokyo, JP;
Kenichi Kobayashi, Tokyo, JP;
Mitsuru Miyazaki, Tokyo, JP;
Yasuyuki Motoshima, Tokyo, JP;
Akira Owatari, Tokyo, JP;
Naoki Dai, Tokyo, JP;
Seiji Katsuoka, Tokyo, JP;
Masahiko Sekimoto, Tokyo, JP;
Toshio Yokoyama, Tokyo, JP;
Teruyuki Watanabe, Tokyo, JP;
Takahiro Ogawa, Tokyo, JP;
Kenichi Kobayashi, Tokyo, JP;
Mitsuru Miyazaki, Tokyo, JP;
Yasuyuki Motoshima, Tokyo, JP;
Akira Owatari, Tokyo, JP;
Naoki Dai, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.