The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Sep. 27, 2004
Toralf Gruner, Aalen-Hofen, DE;
Daniel Kraehmer, Aalen, DE;
Michael Totzeck, Schwaebisch-Gmuend, DE;
Johannes Wangler, Koenigsbronn, DE;
Markus Brotsack, Aalen, DE;
Nils Dieckmann, Huettingen, DE;
Aksel Goehnermeier, Aalen, DE;
Markus Schwab, Herzogenaurach, DE;
Damian Fiolka, Oberkochen, DE;
Markus Zenzinger, Ulm, DE;
Toralf Gruner, Aalen-Hofen, DE;
Daniel Kraehmer, Aalen, DE;
Michael Totzeck, Schwaebisch-Gmuend, DE;
Johannes Wangler, Koenigsbronn, DE;
Markus Brotsack, Aalen, DE;
Nils Dieckmann, Huettingen, DE;
Aksel Goehnermeier, Aalen, DE;
Markus Schwab, Herzogenaurach, DE;
Damian Fiolka, Oberkochen, DE;
Markus Zenzinger, Ulm, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.