Company Filing History:
Years Active: 2008-2014
Title: The Innovative Mind of Markus Zenzinger
Introduction
Markus Zenzinger is a notable inventor based in Ulm, Germany. He has made significant contributions to the field of microlithography, holding a total of 3 patents. His work focuses on advanced exposure methods and systems that enhance the precision of substrate exposure in various applications.
Latest Patents
Zenzinger's latest patents include a microlithographic exposure method and a projection exposure system designed for executing this method. This innovative exposure method involves exposing a substrate positioned in the image plane of a projection objective. The system produces output radiation directed at the substrate, characterized by a specific output polarization state. By utilizing at least one polarization manipulation device, the output polarization state can be variably adjusted to closely align with a nominal output polarization state. This manipulation is performed within a control loop, utilizing polarization-optical measuring data to ensure accuracy and efficiency.
Career Highlights
Throughout his career, Markus Zenzinger has worked with prominent companies in the field, including Carl Zeiss SMT AG and Carl Zeiss SMT GmbH. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in microlithography.
Collaborations
Zenzinger has collaborated with talented individuals such as Toralf Gruner and Daniel Kraehmer. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies in the industry.
Conclusion
Markus Zenzinger's contributions to microlithography and his innovative patents highlight his role as a leading inventor in the field. His work continues to influence advancements in exposure methods and systems, showcasing the importance of innovation in technology.