The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2008

Filed:

Nov. 10, 2005
Applicants:

Kuan-lun Chang, Hsin-Chu, TW;

Ruey-hsin Liu, Hsin-Chu, TW;

Tsyr-shyang Liou, Hsin-Chu, TW;

Chih-min Chiang, Hsin-Chu, TW;

Jun-lin Tsai, Hsin-Chu, TW;

Inventors:

Kuan-Lun Chang, Hsin-Chu, TW;

Ruey-Hsin Liu, Hsin-Chu, TW;

Tsyr-Shyang Liou, Hsin-Chu, TW;

Chih-Min Chiang, Hsin-Chu, TW;

Jun-Lin Tsai, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

A structure having a shallow trench-deep trench isolation region for a semiconductor device is provided.


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