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For the Inventor, By the Inventor

Hsinchu, Taiwan

Tsyr-Shyang Liou

This inventor holds 3 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2006-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsyr-Shyang Liou. Retrieved from https://idiyas.com/inventor/tsyr-shyang-liou-jbnm7p2f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3

% Patents Active = 33.3

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Tainan, TW (2006)
  • Hsin-Chu, TW (2007 - 2008)

Company Filing History:

goldMedal3 out of 42,965 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2006-2008

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3 patents (USPTO):Explore Patents
1. 7372102 - Structure having a shallow trench-deep trench isolation region for a BiCMOS/CMOS technology (2008-05-13),
2. 7250344 - Method of forming a shallow trench-deep trench isolation region for a BiCMOS/CMOS technology (2007-07-31),
3. 7015086 - Method of forming a shallow trench-deep trench isolation region for a BiCMOS/CMOS technology (2006-03-21),

Title: Tsyr-Shyang Liou: Innovator in Semiconductor Technology

Introduction

Tsyr-Shyang Liou is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Liou's latest patents include innovative structures and methods that improve semiconductor technology. One of his notable patents is titled "Structure having a shallow trench-deep trench isolation region for a BiCMOS/CMOS technology." This patent provides a structure that enhances isolation in semiconductor devices. Another important patent is "Method of forming a shallow trench-deep trench isolation region for a BiCMOS/CMOS technology," which outlines a method for creating this advanced isolation region.

Career Highlights

Tsyr-Shyang Liou is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approach have contributed to the company's advancements in technology.

Collaborations

Liou has collaborated with several talented individuals in his field, including Ruey-Hsin Liu and Kuan-Lun Chang. These collaborations have fostered a creative environment that promotes innovation and development in semiconductor technology.

Conclusion

Tsyr-Shyang Liou is a key figure in the semiconductor industry, with a focus on improving device performance through innovative structures and methods. His contributions continue to shape the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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