The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Apr. 14, 2005
Stephan T. Melnychuk, Carlsbad, CA (US);
William N. Partlo, Poway, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
I. Roger Oliver, San Diego, CA (US);
Richard M. Ness, San Diego, CA (US);
Norbert R. Bowering, San Diego, CA (US);
Oleh Khodykin, San Diego, CA (US);
Curtis L. Rettig, Vista, CA (US);
Gerry M. Blumenstock, San Diego, CA (US);
Timothy S. Dyer, Auburn, CA (US);
Rodney D. Simmons, San Diego, CA (US);
Jerzy R. Hoffman, Escondido, CA (US);
R. Mark Johnson, Ramona, CA (US);
Stephan T. Melnychuk, Carlsbad, CA (US);
William N. Partlo, Poway, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
I. Roger Oliver, San Diego, CA (US);
Richard M. Ness, San Diego, CA (US);
Norbert R. Bowering, San Diego, CA (US);
Oleh Khodykin, San Diego, CA (US);
Curtis L. Rettig, Vista, CA (US);
Gerry M. Blumenstock, San Diego, CA (US);
Timothy S. Dyer, Auburn, CA (US);
Rodney D. Simmons, San Diego, CA (US);
Jerzy R. Hoffman, Escondido, CA (US);
R. Mark Johnson, Ramona, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.