The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Apr. 13, 2006
Nicolaas Ten Kate, Almkerk, NL;
Erik Roelof Loopstra, Heeze, NL;
Aleksandr Khmelichek, Brooklyn, NY (US);
Louis J. Markoya, Sandy Hook, CT (US);
Harry Sewell, Ridgefield, CT (US);
Nicolaas Ten Kate, Almkerk, NL;
Erik Roelof Loopstra, Heeze, NL;
Aleksandr Khmelichek, Brooklyn, NY (US);
Louis J. Markoya, Sandy Hook, CT (US);
Harry Sewell, Ridgefield, CT (US);
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A liquid immersion lithography system includes projection optics and a showerhead. The projection optics are configured to expose a substrate with a patterned beam. The showerhead includes a first nozzle and a second nozzle that are configured to be at different distances from a surface of the substrate during an exposure operation.