The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Apr. 07, 2005
Martin Brunotte, Aalen, DE;
Jürgen Hartmaier, Oberkochen, DE;
Hubert Holderer, Königsbronn, DE;
Winfried Kaiser, Aalen, DE;
Alexander Kohl, Aalen, DE;
Jens Kugler, Heubach, DE;
Manfred Maul, Aalen, DE;
Christian Wagner, KS-Eersel, NL;
Martin Brunotte, Aalen, DE;
Jürgen Hartmaier, Oberkochen, DE;
Hubert Holderer, Königsbronn, DE;
Winfried Kaiser, Aalen, DE;
Alexander Kohl, Aalen, DE;
Jens Kugler, Heubach, DE;
Manfred Maul, Aalen, DE;
Christian Wagner, KS-Eersel, NL;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.